Silica veils-conductive diamond powder composite as a new propitious substrate for platinum electrocatalysts

An innovative composite was obtained by a straightforward sol-gel procedure, involving boron-doped diamond powder (BDDP) incorporation into a SiO 2 veil (SiO 2 V) matrix. Composite-coated glassy carbon plates were used as substrate for Pt electrochemical deposition, and the electrodes thus obtained (Pt/BDDP–SiO 2 V) were compared on a relative basis with those prepared in the absence of the silica matrix (Pt/BDDP). SEM measurements have shown that a BDDP substrate promotes Pt cluster formation, whereas on BDDP–SiO 2 V, particles are much smaller (ca. 45 nm to ca. 140 nm). The activity for CH 3 OH oxidation was checked by cyclic voltammetry, and it was found that at Pt/BDDP–SiO 2 V, the main anodic peak is shifted with ca. 0.35 V toward lower potentials, indicating a considerable improvement in the overall process kinetics. Stripping experiments together with long-term polarization measurements demonstrated that when deposited on the BDDP–SiO 2 V support, Pt particles are less susceptible to CO poisoning and this behavior was tentatively ascribed to the presence of a higher relative surface concentration of more stable, oxidized platinum species, as evidenced by XPS.