An Ultrahigh Vacuum Apparatus For H Atom Scattering From Surfaces

REVIEW OF SCIENTIFIC INSTRUMENTS(2018)

引用 18|浏览12
暂无评分
摘要
We present an apparatus to study inelastic H or D atom scattering from surfaces under ultra-high vacuum conditions. The apparatus provides high resolution information on scattering energy and angular distributions by combining a photolysis-based atom source with Rydberg atom tagging time-of-flight. Using hydrogen halides as precursors, H and D atom beams can be formed with energies from 500 meV up to 7 eV, with an energy spread of down to 2 meV and an intensity of up to 10(8) atoms per pulse. A six-axis manipulator holds the sample and allows variation of both polar and azimuthal incidence angles. Surface temperature can be varied from 45 K up to 1500 K. The apparatus' energy resolution (E/Delta F) can be as high as 1000 and its angular resolution can be adjusted between 0.3 degrees and 3 degrees. Published by AIP Publishing.
更多
查看译文
关键词
ultrahigh vacuum apparatus,scattering,surfaces,atom
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要