Overcoming scaling barriers through design technology CoOptimization

2016 IEEE Symposium on VLSI Technology(2016)

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摘要
Design technology co-optimization (DTCO) is the term used to describe the process of deriving a competitive technology definition out of a number of increasingly complex trade-offs. DTCO is not a specific approach or methodology, but rather a commitment to closer collaboration between designers and process engineers born out of necessity to maintain value in semiconductor scaling. This paper aims to clarify this abstract concept through a series of examples encountered in scaling a logic cell from the N14 to the N3 technology node.
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关键词
design technology co-optimization,multiple exposure patterning,sub-resolution scaling
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