Degradation of the Pesticide Chlorpyrifos in Aqueous Solutions with UV/H2O2: Optimization and Effect of Interfering Anions

JOURNAL OF ADVANCED OXIDATION TECHNOLOGIES(2014)

引用 4|浏览5
暂无评分
摘要
This study investigates the use of an advanced oxidation process (AOP) for removal of the pesticide chlorpyrifos in a recirculated system, especially considering the effects of temperature, hydrogen peroxide dosage, pH, pesticide concentration and added inorganic anions. The results indicate that a temperature of 45 degrees C gave the best performance using only UV-radiation, while for the UV/H2O2-method, the temperature did not affect the process. Variations of the pH for the H2O2-and the UV/H2O2-methods were investigated, where it was observed that pH values did not influence the efficiency of the UV/H2O2-method, but enhanced removal of the pesticide occurred at a pH of 10 for the H2O2-method. The optimum dosage for the H2O2-method was 1.5 g.L-1. The effects of the addition of 10 mM of chloride, nitrate, sulfate and bicarbonate anions were found not to be significant.
更多
查看译文
关键词
advanced oxidative process,UV/H2O2,chlorpyrifos,degradation
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要