The Fabrication of MgB2 Film and Nano-Bridge by EB and FIB

100nm thin Mg/B precursor films were prepared on SiC substrates in ZZSX-500 vacuum coating machine. They were annealed by electron-beam(EB) which only took fractions of a second. In this paper the best annealing duration to fabricate the superconducting MgB2 thin films was investigated. Under the optimized annealing condition(accelerating voltage 15kV, electron beam current 5mA, annealing duration 0.7s), the superconducting MgB2 thin film with critical temperature Tconset~35.3 K and transition width ∆Tc~1K was fabricated. Besides that, a nano-bridge (about 100×200nm2) was etched on the superconducting MgB2 thin film by Focused Ion Beam (FIB). It’s a relative simple and efficient method. The nano-bridge exhibited the effect of Josephson junction with RSJ characteristics. At the same time a little loss of superconducting property was detected.