Effects Studying of Annealing to Mechanical Properties Carbon-Doped Ti-O Films Synthesized Using CO<sub>2</sub> Gas

Carbon-doped Ti-O films were deposited on steel and silicon wafer by DC reaction magnetron sputtering (R-MS) using CO2 as carbon and oxygen source. A series of films were prepared by means of changing the flow of CO2 or O2. The effects of annealing temperature ranging from 300 to 650°C on the properties of Ti-O films under vacuum were studied. X-ray diffraction (XRD) and field emission scanning electronic microscope (FESEM) were employed to analyze and observe structure and morphology of pre-or after-annealed Ti-O films. nanoindentation was used to measure nanohardness and modulus, and recovery was also calculated by the curves of load-displacement. Roughness and thickness were estimated by surface profiler. The XRD studies revealed that the doping of carbon was beneficial to the crystallization of the films. The results showed that the particle size of Ti-O films increased with the increase of annealing temperature, as-annealed carbon-doped Ti-O films have fair mechanical performance.