Equipment Utilization Enhancement in Photolithography Area Through a Dynamic System Control Using Multi-Fidelity Simulation Optimization With Big Data Technique

IEEE Transactions on Semiconductor Manufacturing(2017)

引用 8|浏览20
暂无评分
摘要
Photolithographic (Photo) plays a key role in semiconductor manufacturing because of its importance to advanced process shrinking. Even with a small improvement in its operational efficiency, the cost competitiveness in production can be enhanced as a result of the huge amount of share capital cost. However, it is difficult to stabilize the throughput rhythm of Fabs, while keeping a high equipment...
更多
查看译文
关键词
Optimization,Dispatching,Industries,Big Data,Decision making,Lithography,Control systems
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要