Embedded Trench Redistribution Layers (Rdl) By Excimer Laser Ablation And Surface Planer Processes

This paper reports the demonstration of 2-5 mu m embedded trench formation in dry film polymer dielectrics such as Ajinomoto build-up film (ABF) and Polyimide without using chemical mechanical polishing (CMP) process. The trenches in these dielectrics were formed by excimer laser ablation, followed by metallization of trenches by copper plating processes and overburden removal with surface planer tool. The materials and processes integrated in this work are scalable to large panel fabrication at much higher throughput, for interposers and high density fan-out packaging at lower cost and higher performance than silicon interposers.