Chromium Thin-Film Polarizer For High Intensity Light

In this work, we investigate a thin-film polarizer for a high intensity electromagnetic (EM) beam based on Cr nano wire arrays. Commonly used thin-film polarizing components are very sensitive for high power of EM waves and can be easily damaged by focused beams. The solution to this problem could be a thin-film polarizer based on metallic subwavelength structures. This type of optical element has huge resistance compared to typical thin-film polarizers. However, designing such an optical element for the proper wavelength of an EM wave and transmission is not an easy task. In this paper we present numerical as well as experimental results for a specially designed chromium thin-film polarizer for a wavelength of 532nm.