Investigation on Carrier Transport Through AlN Nucleation Layer From Differently Doped Si(111) Substrates

IEEE Transactions on Electron Devices(2018)

引用 39|浏览38
暂无评分
摘要
To get a better insight into the vertical leakage mechanism of GaN-on-Si, the carrier transport from n+, n, p+, and p-Si(111) substrates through the AlN nucleation layer was investigated. A plateau in the current-voltage curve was found only for the AlN/p-Si heterojunction due to depletion of the p-Si substrate. Detailed study illustrated that it was the leaky AlN that cannot effectively block the...
更多
查看译文
关键词
Aluminum nitride,III-V semiconductor materials,Substrates,Silicon,Capacitance,Heterojunctions,Electron traps
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要