Study of nitrogen ion doping of titanium dioxide films

•A two-step process for preparation of N:TiO2 transparent conductor is proposed.•Low energy nitrogen ions are used after Anatase thin film deposition.•Approach allows excellent control of crystal, optical and electronic properties.•Resistivity as low as 3 · 10−1 Ωcm while transparency at 550 nm is about 85%.•High temperatures enable thermal diffusion of Nitrogen inside Anatase film.