CRMA: Incorporating Cut Redistribution With Mask Assignment to Enable the Fabrication of 1-D Gridded Design.

IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems(2018)

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摘要
1-D gridded design is one of the most promising solutions that can enable the scaling to 10 nm technology node and beyond. Line-end cuts are needed to fabricate 1-D layouts, where two techniques are available to resolve the conflicts between cuts: 1) cut redistribution and 2) cut mask assignment. In this paper, we consider incorporating the two techniques to enable the manufacturing of cut pattern...
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关键词
Wires,Layout,Merging,Lithography,Fabrication,Complexity theory
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