Stability of H-Terminated Diamond MOSFETs With V2O5/Al2O3 as Gate Insulator
IEEE Electron Device Letters(2019)
摘要
The effectiveness and long-term stability of the surface transfer doping of H-terminated diamond induced by a very thin V
2
O
5
/Al
2
O
3
double layer were deeply investigated. The experimental results demonstrate that the deposition of a 5 nm Al
2
O
3
layer does not alter the transfer doping properties of the V
2
O
5
/H-terminated diamond interface and remarkably improves the stability of the Hall parameters over time. The H-diamond MOSFETs were fabricated by using V
2
O
5
/Al
2
O
3
as gate insulator and characterized in terms of DC characteristics. The devices showed a saturation drain current density of about 220 mA/mm. The repeated measurements of the DC output characteristics of the MOSFETs were performed and monitored over a period of one month. The variations within ±0.9 % of the drain current and ±0.2 % of the ON-resistance were recorded, demonstrating very high stability of such devices over time.
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关键词
Diamond,MOSFET,Doping,Logic gates,Annealing,Aluminum oxide,Current measurement
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