Degradation of Power P-GaN HEMT Under High Voltage Switching

2018 12th International Conference on Advanced Semiconductor Devices and Microsystems (ASDAM)(2018)

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摘要
This paper reports on an impact of repetitive high voltage hard switching on electrical performance of p-type gate normally off GaN power HEMTs. Hard-switching-related failure and degradation in such power p-GaN HEMTs is currently intensively studied since introduction of p-type gate introduces potentially new/specific effects which were not sufficiently addressed in the literature yet. For these studies, commercially available normally off power AIGaN/GaN HEMTs were exposed to hard switching stress lasting up to 168 h. Stress-induced significant shift of most electrical parameters has been observed. Most impacted parameters are the channel resistance in on-state R DS(on) and the channel leakage current I Ds, leak. Electrically active defects related to stress processes were identified by the DTLS method.
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关键词
high-electron mobility transistor (HEMT),UIS,inductive switching
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