Degradation of Power P-GaN HEMT Under High Voltage Switching
2018 12th International Conference on Advanced Semiconductor Devices and Microsystems (ASDAM)(2018)
摘要
This paper reports on an impact of repetitive high voltage hard switching on electrical performance of p-type gate normally off GaN power HEMTs. Hard-switching-related failure and degradation in such power p-GaN HEMTs is currently intensively studied since introduction of p-type gate introduces potentially new/specific effects which were not sufficiently addressed in the literature yet. For these studies, commercially available normally off power AIGaN/GaN HEMTs were exposed to hard switching stress lasting up to 168 h. Stress-induced significant shift of most electrical parameters has been observed. Most impacted parameters are the channel resistance in on-state R
DS(on)
and the channel leakage current I
Ds, leak.
Electrically active defects related to stress processes were identified by the DTLS method.
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关键词
high-electron mobility transistor (HEMT),UIS,inductive switching
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