Plasma Parameters in an Ar and Ar/Cl$_{\mathrm{2\thinspace }}$Asymmetric Coaxial CCP Used for Plasma Etching of Superconducting Niobium Cavities. Jeremy Peshl, Milka Nikolic,Alexander Godunov,Svetozar Popovic, L. VuskovicBulletin of the American Physical Society（2018）引用 23|浏览6暂无评分AI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
