One-step ion beam irradiation manufacture of 3D micro/nanopatterned structures in SiC materials with tunable work functions

The fabrication and design of high-quality three-dimensional (3D) micro/nanostructures are of great importance for the development of new technology. Herein, we report a one-step technique to controllably manufacture 3D micro/nanopatterned structures with tunable work functions in silicon carbide (SiC). The multiscale micro/nanopatterned structures were produced directly by ion beam irradiation-induced swelling with the assistance of masks. The minimum feature size was ∼52 nm and the swelling height could be controlled flexibly from ∼1 to ∼250 nm. The change of work function of the 3D SiC micro/nanostructures could be tuned in the range between 0 and ∼126.6 meV. Distinct rectifying junction behavior was demonstrated between the irradiated and unirradiated zones. The Young's modulus and hardness values of the irradiated zones stabilized at ∼298.1 GPa and ∼24.9 GPa, respectively.