Intermodulation Linearity Characteristics of 14-nm RF FinFETs

IEEE Transactions on Electron Devices(2019)

引用 9|浏览6
暂无评分
摘要
This paper investigates the RF intermodulation characteristics of transistors from a 14-nm RF FinFET technology using experimental measurements, circuit simulation with Berkeley short-channel IGFET model-common multi-gate (BSIM-CMG), and Volterra series. Linearity sweet spots with respect to gate voltage and RF power, as well as its drain voltage dependence, are examined. Key BSIM-CMG model parame...
更多
查看译文
关键词
Radio frequency,Logic gates,Scattering parameters,Integrated circuit modeling,Capacitance,FinFETs
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要