Effect of thermal annealing on the defects and electrical properties of semi-insulating 6H-SiC

Journal of Crystal Growth(2020)

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摘要
•The property of SiC doesn’t obviously change after annealing at 950 °C and 1350 °C.•The resistivity drops by 5–6 orders of magnitude after annealing at 1650 °C.•The silicon vacancy defects disappear after annealing at 1650 °C.•Both vanadium dopants and intrinsic defects promote semi-insulating property.
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关键词
B2. Silicon carbide,A1. Vanadium doped,A1. Thermal annealing,A1. Electrical property
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