Influence of the surface and subsurface contaminants on laser-induced damage threshold of anti-reflection sub-wavelength structures working at 1064 nm

•Photoresist residues and re-deposition layer contaminants influence LIDT of ARSS.•An optimal ultrasonic cleaning process can improve LIDT of ARSS effectively.•The nano-absorbing surface contaminants significantly reduce the LIDT of ARSS.•These contaminants have little effect on LIDT of AR coating and bare fused silica.