Molecular layer deposition of hybrid siloxane thin films by ring opening of cyclic trisiloxane (V 3 D 3 ) and azasilane.

In this work, we report the first ring opening vapor to solid polymerization of cyclotrisiloxane andN-methyl-aza-2,2,4-trimethylsilacyclopentane by molecular layer deposition (MLD). This process was studiedin situwith a quartz crystal microbalance and the thin film was characterized by X-ray photoelectron spectroscopy, ATR-FTIR and high-resolution transmission electron microscopy.