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Cause and Effects of OFF-State Degradation in Hydrogen-Terminated Diamond MESFETs

IEEE transactions on electron devices/IEEE transactions on electron devices(2020)

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Abstract
This article reports the first comprehensive analysis of the reliability of hydrogen-terminated diamond metal semiconductor field-effect transistors (MESFETs) submitted to OFF-state stress. We demonstrate that stress induces an increase in ON-resistance and a shift in the threshold voltage, along with a decrease in the transconductance peak value. These effects are ascribed to the generation of defects at the diamond surface and/or in the upper semiconductor layers. The defects are generated both in the access regions and under the gate, and their activation energy is 0.30 eV.
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Key words
Logic gates,Stress,Diamond,MESFETs,Semiconductor device measurement,Threshold voltage,Degradation,Deep levels,diamond,hydrogen termination,metal semiconductor field-effect transistor (MESFET),reliability
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