DEPOSITION AND CHARACTERIZATION OF THIN FILMS BASED ON NANOSTRUCTURED WO3 AS SENSORIAL ELEMENTS FOR DETECTION O F H2S

Thin nanostructured films are the state-of-the-art materials for detection of very low limits of toxic gases. The work presents a comparison between the properties of WO3 thin films obtained by two different deposition techniques: Advanced Gas Deposition (AGD) and DC Reactive Sputtering. Films have been characterized by XRD, SEM and XPS. WO3-based sensors have selective sensitivity in H2S detection at operating temperature of 200 degrees C and relative humidity specific to field applications. The potential interferences with CO2, SO2 and NH3 are negligible, highlighting the application potential of WO3.