Large-Area Flat Optics Via Immersion Lithography On Cmos Platform For Laser Beam Shaping

Yuan Hsing Fu,Nanxi Li, Lei Chen,Qize Zhong,Yuan Dong,Dongdong Li,Zhengji Xu,Ting Hu,Yanyan Zhou,Keng Heng Lai, Min Zhu,Shiyang Zhu,Qunying Lin, Shengdi Huang,Navab Singh

2020 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO)（2020）

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摘要

We report a large-area metasurface beam shaper via 12-inch immersion lithography CMOS platform. A 3 x 3 mm(2) metasurface beam shaper is designed to transfer a Gaussian intensity distribution to a Top-Hat intensity distribution. (C) 2020 The Author(s)

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关键词

laser beam shaping,large-area metasurface beam shaper,12-inch immersion lithography CMOS platform,Gaussian intensity distribution,large-area flat optics,top-hat intensity distribution,size 12 inch

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