Study Of Schottky Barrier Detectors Based On A High Quality 4h-Sic Epitaxial Layer With Different Thickness

APPLIED SURFACE SCIENCE(2021)

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摘要
Schottky barrier detectors based on a high-quality 4H-SiC epitaxial layer with varied thickness up to 70 mu m were studied. The detectors had front-side circular Ni/Au Schottky contacts and a back-side full-area Ti/Pt/Au ohmic contact. Current-voltage characteristics in the reverse and forward directions of prepared detector structures were measured. The typical reverse current of the detector structure was below 50 pA at room temperature. The Schottky barrier height, series resistance and ideality factor were evaluated from the forward part of the current-voltage characteristics, and they were 1.3 eV, 1.33, and 638 Omega, respectively. Capacitance-voltage measurement of the detectors up to 600 V was also realized. This provided data to calculate the depletion width, concentration profile and barrier height. The lowest doping concentration of about 7 x 10(13) cm(-3) was determined. The spectrometric performance of the Schottky barrier detector structures was analyzed using an alpha-particle radioisotope source. The detector structures demonstrated a high energy resolution below 20 keV in the full width at half maximum for 5.5 MeV alpha-particles.
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关键词
Semiconductor detector, 4H-SiC, Alpha particle spectrometry, Schottky barrier height
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