Damage effects in 6H-SiC single crystals by Si&H dual ion irradiation: A combined Raman and XRD study

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS(2020)

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摘要
6H-SiC single crystals were implanted with Si and H single and dual ion beams at room temperature to study synergistic effects. 600 keV Si ions with a fluence of 5 x 10(14) cm(-2) and 75 keV H ions with fluences of 1 x 10(15) cm(-2) and 5 x 10(15) cm(-2) were used. The damage states and strain build-up in the as-implanted samples were characterized by Raman spectroscopy combined with high-resolution X-ray diffraction (HRXRD). Irradiation sequences of dual ions influence the damage states significantly. Si + H successively irradiations result in larger damage level, while H + Si successively irradiations give a higher strain level. These results indicate that the damage effects are highly related to irradiating ion species, ion fluences, and irradiation sequences.
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关键词
Silicon carbide,Dual ion irradiation,Radiation damage,Defects,Raman,X-ray techniques
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