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Assembly of mixed Bi4V1.4Nb0.6O11 phase and g-C3N4 photoactive material over rGO: Enhanced organic model pollutants removal under sun light irradiation

Materials Science in Semiconductor Processing(2021)

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摘要
A novel efficient Bi4V1.4Nb0.6O11/g-C3N4 over the rGO ternary composite has been prepared by the cost effect method for diverse model organic molecule pollutants removal. The synergistic interaction between the materials has been investigated by the several characterization tools. The intimate contact between the ternary materials was explored by HRTEM analysis. The photo-catalytic degradation rate of the obtained ternary composite samples was examined for the removal of the MB dye and photo-reduction of the 4-Nitrophenol molecules in direct sun light irradiation. More interestingly, photo removal efficiency for MB molecule was achieved 93 % and the photo-reduction efficiency was 97 % for 4-Nitrophenol solution. The complete mineralization of the MB and 4-NP was further assessed by the LC-MS analysis, which shows the successful destruction of toxic molecules. The Z- scheme charge carrier transfer between the active materials was proposed and which is evidenced by the free radical trapping experiments and ESR trapping experiments.
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关键词
Semiconductors,Catalyst,Layered structure,Organic molecules,Metal oxides
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