High-Speed Parallel Plasmonic Direct-Writing Nanolithography Using Metasurface-Based Plasmonic Lens

•Plasmonic flying head with specified designed air bearing surface achieving ~15 nm flying height and ~65 μrad pitch angle.•A metasurface-cylinder plasmonic lens for ~2x nm full width half height.•Load/unload scheme preventing contact between flying head and photoresist.•A high speed parallel plasmonic direct-writing nanolithography with a minimum line width of ~26 nm.