Forced pulse chemical gas phase permeating process

The forced pulse CVI process features the introduction of forced pulse flow to maintain interface deposition homogeneity and high interface deposition rate. The technological process includes setting fiber, fiber fabric or prefabricated part in the upper part of the graphite mold, filling reaction precursor gas into vacuumized reaction container, leading gas to preheated graphite mold, forcing gas to pass through fiber, fiber fabric or prefabricated part to reach the required reaction pressure within several seconds, maintaining gas in the high temperature reactor for required dwell time, pumping out the gas from the reactor with vacuum pump to decades or hundreds pa, re-filling the precursor gas and so on, so as to reach circulation for fast interface deposition. The technological process of the present invention is suitable for preparing pyrolytic carbon film, SiC film and multilayer (PyC-SiC)n film.