Comparison Of Cavities And Extended Defects Formed In Helium-Implanted 6h-Sic At Room Temperature And 750 Degrees C*

The formation of cavities in silicon carbide is vitally useful to "smart-cut" and metal gettering in semiconductor industry. In this study, cavities and extended defects formed in helium (He) ions implanted 6H-SiC at room temperature (RT) and 750 degrees C followed by annealing at 1500 degrees C are investigated by a combination of transmission electron microscopy and high-resolution electron microscopy. The observed cavities and extended defects are related to the implantation temperature. Heterogeneously distributed cavities and extended defects are observed in the helium-implanted 6H-SiC at RT, while homogeneously distributed cavities and extended defects are formed after He-implanted 6H-SiC at 750 degrees C. The possible reasons are discussed.