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Evaluation Of Ph And Deposition Mechanisms Effect On Tin Sulfide Thin Films Deposited By Chemical Bath Deposition

SUPERLATTICES AND MICROSTRUCTURES(2021)

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摘要
SnS thin films were chemical bath deposited at 65 degrees C, using pH values from 5.5 to 8.5, for 3 h. X-ray diffraction showed orthorhombic SnS thin films with preferential growth along (111) plane. The morphology of the thin films showed plate-like grains with some agglomerates. X-Ray photoelectron spectroscopy clearly showed peaks corresponding to SnS, additionally were detected small peaks associated to SnS2 and Sn. Furthermore, tin oxides peaks were revealed at higher pH values. The results found for SnS thin films deposited at the different pH values indicated that at the lower pH the dominant deposition mechanisms were ion-by-ion and complex decomposition, while they turn to the hydroxide aggregation mechanism as the pH increased. Finally, a superstrate solar cell (SLG/ITO/ZnO/CdS/SnS/Ag) was made using the SnS thin film deposited at pH = 5.5 as the absorber layer. The J-V characteristics of the solar cell were V-oc = 0.104 V, J(sc) = 0.160 mA/cm(2), FF = 38.48%, and eta = 0.013%.
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关键词
Tin sulfide, Chemical bath deposition, pH, X-ray photoelectron spectroscopy
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