Removal Of Selected Antibiotics And Antiretroviral Drugs During Post-Treatment Of Municipal Wastewater With Uv, Uv/Chlorine And Uv/Hydrogen Peroxide

WATER AND ENVIRONMENT JOURNAL(2020)

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摘要
Active pharmaceutical ingredients (APIs) are only partially removed by convectional wastewater treatment plants. This study aimed at assessing the post-treatment degradation of selected antibiotics and antiretroviral drugs by direct UV photolysis and advanced oxidation processes (UV/H(2)O(2)and UV/Cl-2) using low-pressure mercury lamp. The rate of degradation largely followed pseudo first-order reaction kinetics. Amongst the six studied APIs, sulfamethoxazole, ciprofloxacin and zidovudine were readily degraded by more than 90% using direct UV photolysis. Addition of Cl(2)and H(2)O(2)to the UV process led to an increase in the rate of degradation for all the compounds. The effectiveness UV/Cl(2)process was affected to a greater extent by the background effluent organic matter. This implies that higher electrical energy and oxidant would be required in the UV/Cl(2)process relative to UV/H(2)O(2)process. Generally, electrical energy required to remove 90% of the target compounds increased in the order UV/H2O2< UV/Cl-2 < UV processes.
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关键词
advanced oxidation process, antibiotics, antiretroviral drugs, chlorine, hydrogen peroxide, post-treatment, UV, wastewater
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