Ultrahigh- χ Block Copolymer Materials with Versatile Etch Selectivity for Sub-10 nm Pattern TransferJian Sun,Koei Azuma,Youngwoo Choo,Changyeon Lee,Jonathan Dwyer,Yekaterina Rokhlenko,Teruaki Hayakawa,Chinedum Osuji,Padma GopalanBulletin of the American Physical Society(2021)引用 0|浏览2暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要