Aluminum Oxide Thin Film Passivation Prepared by VHF-PEALD and Its Application of Light-Induced µm-Particle Screening Biochip

Jia-Hao Lin,Hung-Wei Wu, You-Sian Chen,Cheng-Yuan Hung,Wei-Chen Tien,Shih-Kun Liu,Tzuu-Shaang Wey

2021 IEEE 3rd Eurasia Conference on Biomedical Engineering, Healthcare and Sustainability (ECBIOS)（2021）

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摘要

This paper proposed a biochip that uses the aluminum oxide (Al2O3) thin film passivation on the photoconductive layer surface. The Al2O3 thin film was deposited by a high frequency (40.68 MHz) plasma-enhanced atomic layer deposition (VHF-PEALD) system to improve the photoconductive layer performance of the biochip. The proposed Al2O3更多

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关键词

Atomic measurements,Atomic force microscopy,Transmission electron microscopy,Atomic layer deposition,Force,Surface roughness,Rough surfaces

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