Tuning the Structural and Optoelectronic Properties of Sub-stoichiometric Molybdenum Trioxide (MoOx, x < 3) Thin Films through the Oxygen Flow During the Reactive Magnetron Sputtering Deposition

We report on the optoelectronic and structural properties of MoO3-x thin layers deposited by reactive DC magnetron sputtering, of a pure Mo target under different oxygen to total flow ratios [r(O2) = O2/Ar, ranging from 0.25% to 16%]. Structural, morphological, optical and electronic transport analyses were systematically carried out on the deposited films. Transmi...