Controlled ALE-type recess of molybdenum for future logic and memory applications

Molybdenum (Mo) is a promising metal for applications requiring low resistivity interconnects or contact lines in small dimensions. Etching of polycrystalline metals like Mo with conventional etching methods can be challenging because of the increased surface roughness and non-uniform recess. In this paper we describe a novel sequential etching method comprising two steps. The first step is an oxi...