A Unified Framework for Layout Pattern Analysis with Deep Causal Estimation

2021 IEEE/ACM International Conference On Computer Aided Design (ICCAD)(2021)

引用 7|浏览87
暂无评分
摘要
The decrease of feature size and the growing complexity of the fabrication process lead to more failures in manufacturing semiconductor devices. Therefore, identifying the root cause layout patterns of failures becomes increasingly crucial for yield improvement. In this paper, a novel layout-aware diagnosis-based layout pattern analysis framework is proposed to identify the root cause efficiently....
更多
查看译文
关键词
Fabrication,Systematics,Design automation,Semiconductor devices,Layout,Estimation,Complexity theory
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要