Ti-Doped Hematite Photoanode Prepared By Spray Pyrolysis Method With Enhanced Photoelectrochemical Performance

Ti-doping hematite photoanode was investigated by easily spray pyrolysis method using self-made spray coating system. Doping with titanium can improve the photoelectrochemical performance of the pure alpha-Fe2O3 thin films. The key point is the effect of Ti doping on improving the conductivity and enhancing charge transfer. When doped with Ti element, V-fb of hematite film shifts negtively about 50 mV, which is good for the hydrogen evolution in the water splitting process. The best IPCE of Ti-doped hematite photoanode reaches 30% under 0.3 V bias at 400nm, ultimately.