Low cost 65nm CMOS platform for Low Power & General Purpose applications

F. Arnaud,B. Duriez, B. Tavel,L. Pain, J. Todeschini, M. Jurdit, Y. Laplanche,F. Boeuf,F. Salvetti, D. Lenoble, J.P. Reynard, F. Wacquant,P. Morin,N. Emonet, D. Barge,M. Bidaud, D. Ceccarelli, P. Vannier, Y. Loquet, H. Leninger, F. Judong,C. Perrot, I. Guilmeau, R. Palla, A. Beverina, V. DeJonghe, M. Broekaart, V. Vachellerie, R.A. Bianchi,B. Borot,T. Devoivre, N. Bicais,D. Roy, M. Denais, K. Rochereau, R. Difrenza,N. Planes,H. Brut, L. Vishnobulta, D. Reber, P. Stolk,M. Woo

Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004.(2004)

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摘要
A 65nm CMOS platform employing General Purpose (GP) and Low Power (LP) devices and 0.5 /spl mu/m/sup 2/ 6T-SRAM bit-cells was developed using both conventional design and low cost CMOS process flow incorporating a strained silicon solution. Fully working 0.5 /spl mu/m/sup 2/ bit-cells with 240mV of SNM and 35 /spl mu/A of cell current at 1.2V operation were obtained. The GP transistor drive currents of 875 /spl mu/A/ /spl mu/m and 400 /spl mu/A/ /spl mu/m for NMOS and PMOS respectively are obtained at V/sub dd/ = 1V, Ioff = 100nA/um. Using the same CMOS flow, 65nm analog transistor parameters are derived for the first time, showing Vt matching (Avt=2.2mV. /spl mu/m) and analog voltage gain factor (G/sub m//G/sub d/>2000 for L = 10 /spl mu/m) at the leading edge for this process technology. NBTI criteria at 125/spl deg/C for both LP and GP transistors are presented and characterized at overdrive conditions.
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low power,cost
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