Flexible Thin Film Coating by Photo-assisted Chemical Solution Process

Abstract Printed electronics is creating many new products given the benefits of the technology compared to conventional electronics, such as thinness, flexibility, cost, ease of manufacture, fast production turn around, “green” technology, power efficiency and more. For this purpose, we have developed the photo reaction of nano-particle method (PRNP) for the preparation of the patterned metal oxide thin film on organic and glass substrates. In this paper, we demonstrate the preparation of transparent conducting thin film or resister film by the PRNP process, and their properties of the obtained films. By using the combination of the two procedures, the resistivity of the film was 5.94×10−4 Ωcm. The resulting ITO film showed mobility as high as 9.99 cm2 V−1 s−1at the carrier density of 1.05 ×1021 cm−3.Also, flexible resistor thin film(RuO2) on PI substrate was prepared by ELAMOD.