1306 Influence of Ozone Microbubble Flow on Photoresist Stripping

The stripping technology of single-wafer processing using ozone is proposed on photoresist stripping in the semiconductor manufacturing in order to reduce the environmental burden. In the present study, we utilize the ozone microbubble with a venturi tube. First, the generation of the ozone microbubbles in the venturi tube is observed via a high speed video camera. Next, to clarify the effect of the superficial liquid velocity, the superficial gas velocity and ozone water concentration on the photoresist stripping rate, the photoresist stripping experiments is conducted. As a result, it is observed that the ozone water concentration affect the photoresist stripping rate. However, compared with the existing research, in this stripping system, it is suggested that both the superficial liquid velocity and the superficial gas velocity affect the photoresist stripping rate more effectively.