Selective patterning using deposition and etch: case of area selective deposition

3D and nanoscale dimensions make patterning extremely difficult to perform. In the past, patterning via plasma etching was a success thanks to the very good capacity of this process to etch one preferential material over the others: selective etching. Next step for advanced patterning will be to add a selective deposition step in addition to the etch one. Good examples are area selective deposition and topographical selective deposition. They will be discuss in this presentation