Plasma-enhanced atomic layer deposition for plasmonic TiN (Erratum)

Lauren M. Otto,Aeron T. Hammack,Shaul Aloni,D. Frank Ogletree,Deirdre L. Olynick,Scott Dhuey,Bethanie J. H. Stadler,Adam M. Schwartzberg

Nanophotonic Materials XIII（2020）

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Publisher’s Note: This paper, originally published on 3 October 2016, was replaced with a corrected version on 12 May 2020. If you downloaded the original PDF but are unable to access the revision, please contact SPIE Digital Library Customer Service for assistance.

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atomic layer deposition,plasmonic tin,erratum,plasma-enhanced

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