Critical-dimension grazing-incidence small angle X-Ray scattering: applications and development (Conference Presentation)
Metrology, Inspection, and Process Control for Microlithography XXXIV(2020)
摘要
As the lithographically manufactured nanostructures are shrinking in size, conventional techniques, such as microscopies (SEM, AFM) reach their resolution limits. We have developed a high-performance Grazing Incidence SAXS simulation tool to reconstruct the in-depth profile highly ordered material such as line gratings [1, 2].
Here, we will present the latest development and applications of the technique using x-rays to characterize line gratings and contact holes. Specifically, we will show how the CD-GISAXS approach has been extended to extract the in-depth profile dispersion of the lines, leading to a quantification of the line edge roughness. Finally, by introducing a recent study which harnessed the chemical sensitivity provided by soft x-ray scattering to extract latent image profiles from resists [3], we highlight new applications for this technique with high potential.
更多查看译文
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要