Single-shot, self-calibrated, real-time wavefront sensing in the EUV and Hard X-ray range for source metrology and beamline optimization

OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS) (2020), paper ETh1A.2(2020)

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摘要
We present Hartmann wavefront sensors as versatile metrology tools to provide real-time characterization and optimization of sources as well as easy, at lambda optical alignment, on a spectral range from EUV to hard X-Ray.
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