Ultra Shallow Junction Formation Using Plasma Doping and Laser Annealing for Sub-65 nm Technology NodesGuk-Hyon Yon,Soo-jin Hong,Gyoung Ho Buh,Tai-su Park,Yu Gyun Shin,U-In Chung,Joo-Tae MoonThe Japan Society of Applied Physics(2005)引用 0|浏览0暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要