High-performance near-infrared spectral sensors based on a wafer-scale fabrication process

We demonstrate a near-infrared (900-1650nm) spectral sensor based on an array of 16 pixels for classifying and quantifying materials and their composition. These pixels consist of resonant-cavity enhanced photodetectors containing a thin absorbing layer, tuning element and cavity. Using a wafer-scale optical lithography process, we achieve a tunable, wavelength-specific response with narrow linewidths of 50nm and high responsivity (R>0.1A/W). The customizability of the response, small-size and robustness make it suitable for portable spectroscopic solutions in a wide variety of applications. The sensing performance is demonstrated on the prediction of moisture in rice with a coefficient of determination of R^2=0.95.