THz silicon photonics: an intersubband emitter

A terahertz intersubband emitter based on silicon is presented. The emission originates from n-type Ge/SiGe quantum cascade structures. We designed a strain-compensated single quantum active region based on a vertical optical transition and tensile-strained Si0.15Ge0.85 barriers. The 51 quantum cascade periods (corresponding to 4.2 μm) were grown on a Si1-xGex reverse graded virtual substrate on Ge/Si(001) substrates. Deeply etched diffraction gratings were processed and the surface emitting devices were characterized at 5 K with a Fourier transform infrared spectrometer. We observed two distinct peaks at 3.4 and 4.9 THz with a line broadening of 20%. This is an important step towards the realization of an Ge/SiGe THz quantum cascade laser.