Improved minority carrier lifetime in p-type GaN segments prepared by vacancy-guided redistribution of Mg

To accelerate the development of GaN power devices, reproducible fabrication of p-type GaN (p-GaN) segments by ion-implantation (I/I) that enables selective-area doping is preferred. In this Letter, the results of time-resolved photoluminescence (PL) and spatially resolved cathodoluminescence (CL) measurements on p-GaN fabricated by I/I are presented. The p-GaN samples of a 220-nm-deep box-shaped Mg concentration profile ([Mg] = 3 x 10 (18) cm (- 3)) were fabricated by sequential I/I of Mg and N followed by atmospheric-pressure post-implantation annealing (PIA). During PIA, Mg redistribution was guided by N-I/I-induced vacancies. The intensities of PL peaks originating from Mg acceptors were increased by increasing the PIA temperature (T-a), indicating progressive activation of Mg and simultaneous decrease in the concentration of nonradiative recombination centers (NRCs). As a result, a record-long room-temperature PL lifetime for the near-band edge emission of Ga-polar Mg-implanted p-GaN (1.4 ps) was obtained when T-a = 1300 degrees C. Because the species of major vacancy-type defects in the present sample was determined as vacancy clusters comprised of few Ga-vacancies (V-Ga) and N-vacancies (V-N) such as (VGaVN)(2-3), the NRC concentration is roughly estimated at around 10 17 cm - 3 provided that (VGaVN)(2-3) are major NRCs with the electron-capture-coefficient of 7 x 10 (- 6) cm (3) s (- 1). Cross-sectional CL linescan images revealed certain activation of Mg from the surface to the leading edge of the box-shaped [Mg] profile, while NRCs remained at the depths right below the box-shaped profile. The results support advantages of using the vacancy-guided Mg redistribution technique for controlling the activated [Mg] profile and realizing p-type Ga-polar GaN:Mg segments by I/I.