Far-UV reflectance and stress of narrowband AlF3/LaF3 multilayersPaloma López-Reyes,Carlos Honrado-Benítez,Nuria Gutiérrez-Luna,Álvaro Ríos-Fernández,Luis V. Rodríguez-de Marcos,Juan I. LarruquertOptical Materials Express(2022)引用 0|浏览5暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要