Ferroelectric polarization retention with scaling of Hf0.5Zr0.5O2 on siliconJaidah Mohan,Heber Hernandez-Arriaga,Yong Chan Jung,Takashi Onaya,Chang-Yong Nam,Esther H. R. Tsai,Si Joon Kim,Jiyoung KimApplied Physics Letters(2021)引用 14|浏览5暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要